Nano Research Facility School of Engineering & Applied Science
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New capability photolithography launches at NRF
Nano Research Facility has acquired a new tool -- Karl Suss MJB3 Mask Aligner with which users can proceed with photolithography along with Headway PWM32 Spin Coater.  The MJB3 Mask Aligner offers three modes -- vacuum, hard, and soft contact modes, and can process patterning with critical dimension as tiny as 0.8 micron.  Photolithography is a process used in microfabrication, which employs light to transfer a geometric pattern from a photo mask to a light-sensitive chemical photoresist on the substrate.  Along with soft lithography capability, NRF is capable of generating, replicating and transfering patterns onto a broad range of substrates.

NanoMan arrives at NRF
Nano Research Facility has launched Veeco NanoMan™ VS, the most advanced scanning probe microscope system available for high-resolution imaging, direct nanoscale manipulation, and high-definition nanolithography. The system combines the high-performance Hybrid XYZ scanning head, the NEW NanoScope® V controller, an intuitive user interface, and the world’s most popular SPM to provide precision scanning and unmatched probe control in air or liquid. It offers easy-to-follow graphic user interface to reduce the time for initial setup by engaging the sample with the probe, automatically adjusting scanning parameters, and obtaining high-quality images at a push of a button. It can display and acquire eight images simultaneously as well as reduce time spent looking for features with an ultrahigh image resolution (5120 x 5120 pixel density).

NRF became a new member of the NSF supported National Nanotechnology Infrastructure Network (NNIN) with our contribution to the community at the intersection of nanotechnology and important needs in public health and environment from March 2009.


NanoDays at the St. Louis Science Center

The NRF was an exhibitor at the NanoDays event this past summer at the St. Louis Science Center. This event took place on the first Friday of each month.  We involved the NNIN REU summer interns for a great experience working with all the many visitors of all ages. Everyone seemed to have a good time and many learned something about Nanotechnology.


Congratulations to our REU Summer Interns!
Congratulations to the following students who have been selected as the 2009 summer REU program interns:

Richard Frnka - Project: Pattern deposition of nanoparticles of different shapes by aerosol route
Nathaniel Hogrebe - Project: Nanostructured scaffolds for tissue engineering applications
Angela Horst - Project: Toxicity of Nano-particles to microorganisms
Alexandra Rutz - Project: Synthesis and Properties of Manganese Oxide Nanoparticles for Environmental Applications
Michael Zakrewsky - Project: Fabrication, characterization and modeling of a novel optofluidic bio/chemical sensor

We look forward to hosting you all this summer!  Welcome!